2 Post-doc research positions “Plasma interaction with thin film materials for extreme UV”

We are looking for two motivated and skilled post-doctoral researchers to carry out advanced physics research on understanding the interaction of hydrogen based plasma with thin films used for extreme ultraviolet (EUV) optics applications.

The main aim of the first project is to develop understanding how uptake and diffusion of hydrogen can be monitored in-situ, under realistic test conditions. This project will involve collaboration with the Technical University Delft to study hydrogen uptake in materials with in-situ neutron scattering.

The second project focuses on hydrogen plasmas that contain small amounts of reactive molecules as water or nitrogen. Our aim is to understand in detail how processes as ballistic impact, reaction probabilities and ion penetration depend on type and energy of ions in the plasma, as well as on the composition of the thin film sample.

Both projects are part of a larger research project on the physics of plasma-surface interactions, currently running in the XUV Optics Group at Twente (www.utwente.nl/xuv). We develop forefront fundamental research, relevant to high tech applications in collaboration with our industrial partners (Zeiss, ASML, Malvern Panalytical and VDL). The research will take place in a state-of-the-art thin film laboratory within the MESA+ Institute for Nanotechnology at the University of Twente, which will allow you ample opportunities to collaborate and interact with various academic and industrial partners.

Your goal is to improve the understanding how plasma, radicals and ions interact with thin film coatings for EUV optics, with the ultimate aim to predict and improve the lifetime of such coatings.

Project 1:

• Design and prepare thin film model systems for measuring hydrogen uptake in EUV materials, using facilities in the XUV Optics group.
• Measure uptake of hydrogen in these thin films using a newly developed measurement cell for in-situ neutron scattering during exposure to hydrogen radicals and/or plasma.
• Compare the obtained results with other techniques for measuring hydrogen uptake and diffusion of hydrogen in thin films.

Project 2:

• Design and execute experiments to expose thin film systems to plasma conditions relevant for understanding potential damage mechanisms under EUV exposure, using existing plasma exposure tools in the XUV group.
• Investigate changes in film composition and structure by using in-vacuo X-ray photoelectron spectroscopy and ex-situ electron microscopy.
• Perform reference experiments with other materials and/or exposure conditions to consolidate our understanding of physical mechanisms leading to modification of film stacks by plasma exposure.

Requirements:

• You have a PhD degree in physics, physical chemistry or materials science, or expect to obtain your PhD degree soon.
• You have affinity with interaction of plasma or ion beams with surfaces, physical vapour deposition (PVD) of thin films, physics and chemistry of solid surfaces and/or surface or thin film analysis.
• You are an excellent team player in an enthusiastic group of scientists and engineers working on a common theme.
• You are creative, like to push boundaries, and are highly motivated to address a major science challenge in thin film physics.
• You are fluent in English and able to collaborate intensively with industrial and academic parties in regular meetings and work visits.

Salary Benefits:

• You will be appointed on a fulltime position for 1.5 or 2 years with possible extension.
• The university offers a dynamic ecosystem with enthusiastic colleagues in a stimulating scientific environment.
• The post-doc salary is between € 4.020 and € 5.278 gross per month depending on experience and qualifications.
• The offer further involves: a holiday allowance of 8% of the gross annual salary and a year-end bonus of 8.3%, a solid pension scheme, a minimum of 29-day holidays, and numerous professional and personal development programs.

40 hours per week

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